Silicon Carbide Substrates | SiC Wafers

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WeiTai Energy Technology Co., Ltd ndiwotsogola wotsogola wokhazikika pazophatikizika ndi zida zapamwamba za semiconductor.Ndife odzipereka kuti tipereke zinthu zapamwamba, zodalirika, komanso zatsopano pakupanga semiconductor, mafakitale a photovoltaic ndi magawo ena okhudzana nawo.

Zogulitsa zathu zikuphatikiza zinthu za SiC/TaC zokutidwa ndi graphite ndi zinthu za ceramic, kuphatikiza zida zosiyanasiyana monga silicon carbide, silicon nitride, ndi aluminium oxide ndi zina.

Pakali pano, ndife opanga okha kupereka chiyero 99.9999% SiC ❖ kuyanika ndi 99.9% recrystallized pakachitsulo carbide.Kutalika kwa zokutira kwa SiC kwambiri titha kuchita 2640mm.


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SiC-Wafer

Silicon carbide (SiC) single crystal chuma ali ndi gulu lalikulu kusiyana m'lifupi (~ Si 3 nthawi), mkulu matenthedwe madutsidwe (~Si 3.3 nthawi kapena GaAs 10 nthawi), mkulu ma elekitironi machulukitsidwe mlingo kusamuka (~Si 2.5 nthawi), mkulu kuwonongeka magetsi munda (~ Si 10 nthawi kapena GaAs 5 nthawi) ndi zina zabwino kwambiri.

Zida za SiC zili ndi ubwino wosasinthika pankhani ya kutentha kwakukulu, kuthamanga kwapamwamba, maulendo apamwamba, zipangizo zamagetsi zamagetsi komanso kugwiritsa ntchito kwambiri zachilengedwe monga zakuthambo, asilikali, mphamvu za nyukiliya, ndi zina zotero, zimapanga zolakwika za zipangizo zamakono zogwiritsira ntchito semiconductor pazochitika. ntchito, ndipo pang'onopang'ono akukhala odziwika bwino a semiconductor amphamvu.

4H-SiC Silicon carbide gawo lapansi specifications

Chinthu项目

Specifications参数

Polytype
晶型

4H -SiC

6H-SiC

Diameter
晶圆直径

2 inchi |3 inchi |4 inu |6 inchi

2 inchi |3 inchi |4 inu |6 inchi

Makulidwe
厚度

330 μm ~ 350 μm

330 μm ~ 350 μm

Conductivity
导电类型

N - mtundu / Semi-insulating
N型导电片/ 半绝缘片

N - mtundu / Semi-insulating
N型导电片/ 半绝缘片

Dopant
掺杂剂

N2 (Nayitrogeni)V (Vanadium)

N2 (Nayitrogeni) V (Vanadium)

Kuwongolera
晶向

Pa axis <0001>
Kuchokera kumtunda <0001> kuchoka ku 4 °

Pa axis <0001>
Kuchokera kumtunda <0001> kuchoka ku 4 °

Kukaniza
电阻率

0.015 ~ 0.03 ohm-masentimita
(4H-N)

0.02 ~ 0.1 ohm-masentimita
(6H-N)

Kachulukidwe ka Micropipe (MPD)
微管密度

≤10/cm2 ~ ≤1/cm2

≤10/cm2 ~ ≤1/cm2

TTV
总厚度变化

≤ 15 μm

≤ 15 μm

Bow / Warp
翘曲度

≤25 μm

≤25 μm

Pamwamba
表面处理

DSP/SSP

DSP/SSP

Gulu
产品等级

Magulu Opanga / Kafukufuku

Magulu Opanga / Kafukufuku

Crystal Stacking Sequence
堆积方式

Mtengo wa ABCB

Mtengo wa ABCABC

Lattice parameter
晶格参数

a=3.076A , c=10.053A

a=3.073A , c=15.117A

Mwachitsanzo/eV(Band-gap)
禁带宽度

3.27 eV

3.02 eV

ε (Dielectric Constant)
介电常数

9.6

9.66

Refraction Index
折射率

n0 =2.719 ne =2.777

n0 =2.707 , ne =2.755

6H-SiC Silicon Carbide gawo la gawo lapansi

Chinthu项目

Specifications参数

Polytype
晶型

6H-SiC

Diameter
晶圆直径

4 inu |6 inchi

Makulidwe
厚度

350μm ~ 450μm

Conductivity
导电类型

N - mtundu / Semi-insulating
N型导电片/ 半绝缘片

Dopant
掺杂剂

N2 (Nayitrogeni)
V (Vanadium)

Kuwongolera
晶向

<0001> kuchoka pa 4°± 0.5°

Kukaniza
电阻率

0.02 ~ 0.1 ohm-masentimita
(Mtundu wa 6H-N)

Kachulukidwe ka Micropipe (MPD)
微管密度

≤ 10/cm2

TTV
总厚度变化

≤ 15 μm

Bow / Warp
翘曲度

≤25 μm

Pamwamba
表面处理

Ngati Nkhope: CMP, Epi-Ready
C Nkhope: Kuwala Polish

Gulu
产品等级

Gulu la kafukufuku

Semicera Ntchito Semicera ntchito 2 Makina opangira zida CNN processing, kuyeretsa mankhwala, CVD zokutira Utumiki wathu


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